机械剥离单层WS2

此产品为机械剥离单层二硫化钨。 美国2D semiconductors进口。

应用方向：

主要应用于半导体电子器件，传感器-探测器，光学器件等研究。

Product Description

Monolayer tungsten disulfide (1H-WS₂) flakes have been exfoliated from bulk tungsten disulfide (2H-WS₂) onto 90nm thermal oxide and measures from 5micron up to 40micron in size. Each sample contains at least one single-layer WS₂ and is easy to find with the given x and y coordinates. Full characterization is performed on each monolayer flake. Typically, single-layer WS₂ show strong PL at 2.02eV with 0.04 to 0.08eV FWHM, All the data is provided with the sample and data includes Raman, photoluminescence, 100x optical images, and x,y coordinates. Photoluminescence (PL): In the single layer form, tungsten diselenide possesses direct band-gap at 2.02eV. PL measurements show strong PL peak located at 2.02V with 0.04-0.08 eV PL FWHM. Optical Microscope images: Each sample is inspected under the optical microscope and x-y coordinates are recorded.
Possible applications:
• Electronics
• Sensors - detectors
• Optics
• STM - AFM applications
• Molecular detection - binding
• Ultra-low friction studies
• Materials science and semiconductor research