Monolayer Continous MoS2 Film on Silicon Wafer

Size:10mm*10mm (Sale!)

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1. The monolayer and continuous MoS2 film is epitaxially grown on silicon surface.
2. P type,N type, light doped , highly doped silicon wafer are used for this products. The normal thickness is 0.5mm, 0.8mm , and the normal size is 10*10mm,15*15mm,20*20mm.
3. If you have special requests, please contact:


MoS2 on optical quartz, flexible PET, PDMS, silicon wafer and so on are also provided. Sample size can be customized. Contact and tell us your requirements.

Lead time

In stock. Lead time: 1~3 business days.


Molybdenum Disulfide (MoS2) is graphene-like 2D material. One obvious difference with graphene is that MoS2 has a bandgap. Monolayer MoS2 Film is a semiconductor with a direct bandgap of ~1.8eV, while Bilayer or multilayer MoS2 film is has an indirect bandgap decreasing to 1.2eV with layer increase.

6Carbon MoS2 film is produced with chemical vapor deposition (CVD) method, depositing monolayer or multilayer MoS2 Films on various substrates, such as SiO2/Si wafer, Silicon wafer,optical quartz plate,mica, sapphire and so on. We also supply customized MoS2 products based on customers' requirements or design.


MoS2 films are mainly used in optoelectronics fields.